The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2014
Filed:
Jan. 29, 2009
Bruno Alexander Korngold, Drunen, NL;
Hindrik Willem DE Vries, Tilburg, NL;
Eugen Aldea, Eindhoven, NL;
Bruno Alexander Korngold, Drunen, NL;
Hindrik Willem de Vries, Tilburg, NL;
Eugen Aldea, Eindhoven, NL;
FujiFilm Manufacturing Europe B.V., Tilburg, NL;
Abstract
Method and plasma treatment apparatus for treatment of a substrate surface () using an atmospheric pressure plasma. An atmospheric pressure plasma is provided in a treatment space () between a first electrode () and a second electrode (). Furthermore, a substrate () and a mask web () in contact with the substrate () are provided. A plasma generating power is applied to the first and second electrode () for treatment of surface areas of the substrate () exposed by the mask web (), in which the substrate () and mask web () are moved synchronously through the treatment space ().