The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2004
Filed:
Jul. 11, 2002
Hindrik Willem de Vries, Tilburg, NL;
Fuyuhiko Mori, Tilburg, NL;
Eugen Aldea, Tilburg, NL;
Mauritius Cornelius Maria van de Sanden, Tilburg, NL;
Fuji Photo Film B.V., Tilburg, NL;
Abstract
Apparatus for producing and sustaining a glow discharge plasma in a plasma discharge space comprising at least two oppositely spaced electrodes, means for supplying a gas or a gas mixture under atmospheric pressure conditions in the discharge space, AC power supply means for energizing the electrodes, and electric stabilisation means for stabilizing current variations in the plasma. The stabilisation means connect between the electrodes and the power supply means, and are arranged for providing a negative feedback opposed to a positive feedback of the plasma to instabilities in the plasma.