Hin-Yiu Anthony Chung

Title: Innovations of Hin-Yiu Anthony Chung

Introduction

Hin-Yiu Anthony Chung is a notable inventor based in Ulm, Germany. He has made significant contributions to the field of lithography, particularly through his innovative patent. His work is recognized for its technical complexity and practical applications in the industry.

Latest Patents

Hin-Yiu Anthony Chung holds a patent for a lithography apparatus and method for producing a mirror arrangement. This patent describes a lithography apparatus that includes a mirror arrangement with a mirror substrate featuring a reflecting surface. The design incorporates a side wall that extends around the circumference of the mirror substrate, along with mounting elements that secure the mirror arrangement to a structural element of the lithography apparatus. The patent emphasizes the relationship between the thickness of the side wall and the shortest path through the mirror material, ensuring optimal performance in lithography applications. He has 1 patent to his name.

Career Highlights

Hin-Yiu Anthony Chung is associated with Carl Zeiss SMT GmbH, a leading company in the field of optical systems and lithography technology. His role at the company has allowed him to work on cutting-edge technologies that advance the capabilities of lithography.

Collaborations

Hin-Yiu has collaborated with esteemed colleagues such as Dirk Schaffer and Wilfried Clauss. Their combined expertise contributes to the innovative projects at Carl Zeiss SMT GmbH.

Conclusion

Hin-Yiu Anthony Chung's contributions to lithography technology through his patent demonstrate his commitment to innovation in the field. His work continues to influence advancements in optical systems and manufacturing processes.