This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Nv Bekaert Sa. Active years: 2009.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2009
Title: Hilde Delrue: Innovator in Sputter Target Manufacturing
Introduction
Hilde Delrue is a notable inventor based in Aalst, Belgium. She has made significant contributions to the field of manufacturing, particularly in the development of sputter targets. Her innovative approach has led to the creation of a patented process that enhances the efficiency and effectiveness of sputter target production.
Latest Patents
Hilde Delrue holds a patent for a process for the manufacturing of a sputter target. This invention involves several key steps, including providing a target holder, applying an intermediate layer on the target holder, and then applying a top layer that consists of a material with a melting point substantially higher than that of the target material. The process culminates in heating the target holder that is coated with both the intermediate and top layers. This patent reflects her commitment to advancing manufacturing techniques.
Career Highlights
Throughout her career, Hilde has demonstrated a strong dedication to innovation in her field. Her work at Nv Bekaert SA has positioned her as a leader in the industry. She has successfully navigated the complexities of manufacturing processes, contributing to the development of advanced materials and techniques.
Collaborations
Hilde Delrue has collaborated with several professionals in her field, including Wilmert De Bosscher and Johan Vanderstraeten. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of new technologies.
Conclusion
Hilde Delrue's contributions to the manufacturing of sputter targets exemplify her innovative spirit and dedication to her craft. Her patented process not only enhances production efficiency but also showcases her expertise in the field. Her work continues to influence the industry and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
