The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7563488 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 21, 2009

Filed:

Jul. 10, 2002
Applicants:

Wilmert DE Bosscher, Drongen, BE;

Hilde Delrue, Aalst, BE;

Johan Vanderstraeten, Gavere, BE;

Inventors:

Wilmert De Bosscher, Drongen, BE;

Hilde Delrue, Aalst, BE;

Johan Vanderstraeten, Gavere, BE;

Assignee:

NV Bekaert SA, Zwevegem, BE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to a process for manufacturing a sputter target. The process comprises the steps of—providing a target holder (); —applying an intermediate layer () on said target holder; —applying a top layer () on top of said intermediate layer; said top layer comprising a material having a melting point which is substantially higher than the melting point of said target material; —heating the target holder coated with said intermediate layer and said top layer.


Find Patent Forward Citations

De Bosscher, Wilmert. (2009). Process for the manufacturing of a sputter target (U.S. Patent No. 7563488). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7563488

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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