Kanagawa, Japan

Hikaru Sugimoto

USPTO Granted Patents = 1 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Hikaru Sugimoto

Introduction

Hikaru Sugimoto is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of microstructure manufacturing through his innovative patent. His work is particularly relevant in industries that utilize photosensitive resin compositions.

Latest Patents

Hikaru Sugimoto holds a patent for a method for manufacturing microstructures that include cured products of photosensitive resin compositions. This method involves several steps, including forming at least two layers of photosensitive resin compositions, each containing a photopolymerization initiator. The process includes patterning exposure and collectively developing the exposed layers to obtain a microstructure. Notably, 90% by mass or more of the photopolymerization initiators in at least one of the adjacent layers is a nonionic photopolymerization initiator.

Career Highlights

Sugimoto is associated with Canon Kabushiki Kaisha, a leading company in imaging and printing technologies. His work at Canon has allowed him to explore and develop advanced manufacturing techniques that enhance the capabilities of microstructures.

Collaborations

He has collaborated with notable coworkers, including Yohei Hamade and Kazunari Ishizuka. Their combined expertise contributes to the innovative environment at Canon, fostering advancements in technology.

Conclusion

Hikaru Sugimoto's contributions to the field of microstructure manufacturing highlight the importance of innovation in technology. His patent reflects a significant advancement in the use of photosensitive resin compositions, showcasing his role as a key inventor in this domain.

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