Kyoto, Japan

Hikaru Kimura

This inventor holds 1 USPTO granted patent. Top assignee: Towa Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hikaru Kimura. Retrieved from https://idiyas.com/inventor/hikaru-kimura-ugiripcs

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Hikaru Kimura: Innovator in Laser Processing Technology

Introduction

Hikaru Kimura is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of laser processing technology. His innovative approach has led to the development of a unique device that enhances the manufacturing process of various articles.

Latest Patents

Hikaru Kimura holds a patent for a laser processing device and a processed article manufacturing method. This invention provides a laser processing device that enables a film to be stabilized and processed effectively. The device comprises a conveyance mechanism that conveys a film, a holding mechanism with a pair of holding parts that can sandwich and hold the lateral portions of the processing range of the film, and a laser mechanism for processing the film held by the holding mechanism. He has 1 patent to his name.

Career Highlights

Hikaru Kimura is associated with Towa Corporation, where he applies his expertise in laser technology. His work has been instrumental in advancing the capabilities of laser processing devices, making them more efficient and reliable.

Collaborations

Some of his notable coworkers include Hideo Ichihashi and Shun Hirano. Their collaborative efforts contribute to the innovative environment at Towa Corporation.

Conclusion

Hikaru Kimura's contributions to laser processing technology exemplify the spirit of innovation. His patent and work at Towa Corporation highlight his commitment to advancing manufacturing methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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