Company Filing History:
Years Active: 2008
Title: Hiew Watt Ng - Innovator in Semiconductor Technology
Introduction
Hiew Watt Ng is a notable inventor based in Kao-Hsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to etching processes.
Latest Patents
Hiew Watt Ng holds a patent for an "Etchant and method for forming bumps." This invention outlines a method for creating bumps on a substrate that includes an adhesive, a barrier, and a wetting layer. The process involves forming a patterned photoresist on the wetting layer, depositing solder, and utilizing etchants to remove specific layers, ultimately leading to the formation of bumps.
Career Highlights
Hiew Watt Ng is associated with Advanced Semiconductor Engineering, Inc., where he applies his expertise in semiconductor manufacturing. His work has been instrumental in advancing techniques that enhance the efficiency and effectiveness of semiconductor devices.
Collaborations
Hiew Watt Ng collaborates with talented individuals such as En-Chieh Wu and Hui-Hung Chen, contributing to a dynamic work environment that fosters innovation and creativity.
Conclusion
Hiew Watt Ng's contributions to semiconductor technology through his patent and collaborative efforts highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor manufacturing processes.