Richardson, TX, United States of America

Hieu A Lam



Average Co-Inventor Count = 2.4

ph-index = 5

Forward Citations = 75(Granted Patents)


Company Filing History:


Years Active: 2004-2011

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8 patents (USPTO):Explore Patents

Title: Innovations by Hieu A Lam: Pioneering Etch Property Determination and Process Performance Prediction

Introduction

Hieu A Lam, an accomplished inventor located in Richardson, TX, has made substantial contributions to the field of plasma processing technology. With a total of 8 patents to his name, he is recognized for innovative methods that enhance etching and material processing systems. His work is not only vital for advancing technology but also for improving manufacturing processes in various industries.

Latest Patents

Hieu A Lam's latest patents showcase his innovative thinking and technical proficiency. One significant invention is the "Method and apparatus for determining an etch property using an endpoint signal." This invention introduces a plasma processing system designed for etching layers on substrates. It features a process chamber coupled with a diagnostic system that measures endpoint signals, allowing for accurate in-situ determination of etch rates and their uniformity. Another notable patent is the "Method and system for predicting process performance using material processing tool and sensor data," which involves constructing a prediction model based on recorded tool and process performance data. The model utilizes partial least squares analysis to compute correlation data, streamlining the performance prediction in material processing systems.

Career Highlights

Hieu A Lam is currently affiliated with Tokyo Electron Limited, a renowned company in the field of semiconductor production equipment and services. His expertise and inventive spirit contribute significantly to the organization's innovative projects and advancements in technology. Throughout his career, Lam has played a pivotal role in developing cutting-edge solutions that drive efficiency and effectiveness in plasma processing.

Collaborations

In his professional journey, Hieu A Lam has collaborated with various talented individuals, including colleagues Hongyu Henry Yue and John Christopher Shriner. These collaborations not only foster innovation but also create a dynamic work environment that encourages the exchange of ideas and expertise.

Conclusion

Hieu A Lam stands as a prominent figure within the field of plasma processing technology. His patents not only exemplify his innovative capabilities but also offer practical solutions for industry challenges. As he continues to work alongside skilled professionals at Tokyo Electron Limited, his contributions are likely to impact the technology landscape for years to come.

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