This inventor holds 1 USPTO granted patent. Top assignee: Nissin Ion Equipment Co., Ltd.. Active years: 2009.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2009
Title: The Innovations of Hideyuki Tanaka
Introduction
Hideyuki Tanaka is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of ion implantation technology. His work has led to advancements that are crucial for various applications in semiconductor manufacturing.
Latest Patents
Tanaka holds a patent for an ion implanter. This innovative device features an analyzing electromagnet that consists of a first inner coil, a second inner coil, three first outer coils, three second outer coils, and a yoke. The inner coils are saddle-shaped and work together to generate a main magnetic field that bends an ion beam in the X direction. Each outer coil is also saddle-shaped and generates a sub-magnetic field that corrects the main magnetic field. The coils are designed with a notched portion in a fan-shaped cylindrical stacked configuration, which is created by winding laminations of an insulation sheet and a conductor sheet multiple times around the outer peripheral face of a laminated insulator.
Career Highlights
Tanaka is associated with Nissin Ion Equipment Co., Ltd., a company known for its expertise in ion implantation equipment. His work at this company has been instrumental in developing advanced technologies that enhance the efficiency and precision of ion implantation processes.
Collaborations
Throughout his career, Tanaka has collaborated with notable colleagues, including Takatoshi Yamashita and Tadashi Ikejiri. These collaborations have fostered an environment of innovation and have contributed to the success of various projects within the company.
Conclusion
Hideyuki Tanaka's contributions to ion implantation technology exemplify the impact of innovative thinking in the field of semiconductor manufacturing. His patent for the ion implanter showcases his dedication to advancing technology and improving industrial processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
