Hideyuki Hatoh

Title: Innovations of Hideyuki Hatoh

Introduction

Hideyuki Hatoh is a prominent inventor based in Miyagi, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 3 patents. His work focuses on improving gas supply methods and systems, which are crucial for the efficiency of semiconductor devices.

Latest Patents

Hatoh's latest patents include a gas supply method for semiconductor manufacturing apparatus, a gas supply system, and a semiconductor manufacturing apparatus. The gas supply method involves controlling communication between first and second gas pipes and a diffusion chamber using various valves. It also includes a pressurization step for both gases and an exhaust step to discharge gas within the diffusion chamber. Another notable patent is a method of forming a pattern on a silicon layer of a substrate, which includes etching the substrate by plasma and cleaning it using a specific gas mixture after the etching step.

Career Highlights

Hatoh is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing industry. His innovative approaches have contributed to advancements in semiconductor technology, enhancing the performance and reliability of devices.

Collaborations

He has collaborated with notable coworkers such as Katsuyuki Ono and Yusuke Hirayama, further enriching the research and development environment at his company.

Conclusion

Hideyuki Hatoh's contributions to semiconductor manufacturing through his innovative patents demonstrate his expertise and commitment to advancing technology in this critical field. His work continues to influence the industry positively.