Hidetoshi Oishi

Title: Hidetoshi Oishi: Innovator in Solid-State Imaging Technology

Introduction

Hidetoshi Oishi is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of solid-state imaging devices, holding a total of eight patents. His work focuses on reducing noise in imaging technology while optimizing the layout of transistors.

Latest Patents

One of Hidetoshi Oishi's latest patents is a solid-state imaging device designed to minimize noise while maintaining a compact layout of transistors in the readout circuit. This innovative device features a first substrate section and a second substrate section, with a readout circuit and adjacent first and second transistor cells. The design includes amplification transistors and a sensor pixel on the first substrate, ensuring efficient operation. Another notable patent is for a complementary transistor and semiconductor device, which consists of a first and second transistor with active regions formed by layering specific materials. This design enhances the performance of the transistors by utilizing different conductivity types.

Career Highlights

Hidetoshi Oishi has worked with renowned companies such as Sony Corporation and Sony Semiconductor Solutions Corporation. His experience in these organizations has allowed him to develop cutting-edge technologies in the field of imaging and semiconductor devices.

Collaborations

Hidetoshi has collaborated with notable coworkers, including Koichi Matsumoto and Kazuyuki Tomida. Their combined expertise has contributed to advancements in imaging technology.

Conclusion

Hidetoshi Oishi's innovative work in solid-state imaging devices and transistors has made a significant impact in the field. His patents reflect a commitment to enhancing technology while addressing challenges in noise reduction and layout optimization.