Omiya, Japan

Hideshi Ajimura

This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Materials Corporation. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideshi Ajimura. Retrieved from https://idiyas.com/inventor/hideshi-ajimura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Hideshi Ajimura: Innovator in Alumina Production

Introduction

Hideshi Ajimura is a notable inventor based in Omiya, Japan. He has made significant contributions to the field of materials science, particularly in the production of alumina. His innovative approach has led to advancements that benefit various industrial applications.

Latest Patents

Hideshi Ajimura holds a patent for a process for producing a highly crystalline, fine α-alumina powder. This novel process involves calcining aluminum hydroxide in the presence of fine silica powder. The resulting alumina is in the alpha form and boasts a specific surface area of at least 10 m²/g. This innovation is crucial for industries that require high-purity alumina.

Career Highlights

Ajimura is associated with Mitsubishi Materials Corporation, where he has been instrumental in developing advanced materials. His work has not only enhanced the company's product offerings but has also contributed to the broader field of materials engineering.

Collaborations

Throughout his career, Hideshi Ajimura has collaborated with esteemed colleagues such as Akira Nishihara and Tadashi Nakamura. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Hideshi Ajimura's contributions to the production of α-alumina powder exemplify the impact of innovative thinking in materials science. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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