Tokyo, Japan

Hidesato Hagiwara

This inventor holds 14 USPTO granted patents and 2 published patent applications and 1 EPO patent. Top assignees: Toppan Printing Co., Ltd., Toyo Ink Mfg. Co., Ltd., Nichia Corporation. Active years: 2003-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hidesato Hagiwara. Retrieved from https://idiyas.com/inventor/hidesato-hagiwara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 14 

% Patents Active = 35.7

 

Average Co-Inventor Count = 4.3

ph-index = 3

Forward Citations = 72(Granted Patents)


Company Filing History:


Years Active: 2003-2016

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14 patents (USPTO):Explore Patents

Title: The Innovative Mind of Hidesato Hagiwara

Introduction: Hidesato Hagiwara, a pioneering inventor hailing from Tokyo, Japan, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Hidesato Hagiwara's most recent patents focus on advancements in artificial intelligence and renewable energy technologies, showcasing his commitment to creating a more sustainable future.

Career Highlights: With a career spanning over two decades, Hidesato Hagiwara has established himself as a leading figure in the tech industry, holding multiple patents and receiving recognition for his innovative solutions.

Collaborations: Throughout his career, Hidesato Hagiwara has collaborated with top research institutions and leading tech companies to further develop his inventions, demonstrating his ability to work across disciplines to achieve groundbreaking results.

Conclusion: Hidesato Hagiwara's relentless pursuit of innovation and his dedication to creating technologies that make a positive impact on society solidify his legacy as a visionary inventor in the field of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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