Company Filing History:
Years Active: 1985-1989
Title: Hideo Shuyama: Innovator in Halogen-Containing Polyacrylate Derivatives
Introduction
Hideo Shuyama is a notable inventor based in Hofu, Japan. He has made significant contributions to the field of materials science, particularly in the development of halogen-containing polyacrylate derivatives. With a total of 3 patents to his name, Shuyama's work has implications for various applications in resist materials.
Latest Patents
Shuyama's latest patents include a method of image-wise exposing and developing halogen-containing polyacrylate derivatives. These derivatives are characterized by a specific formula where A is a structural unit derived from a copolymerizable monomer with a double bond. The formula also includes R, which can be a hydrogen atom or a fluorinated methyl group, with specific conditions regarding R1 and R2. Additionally, R3 can be a hydrogen atom or a lower alkyl group, while X represents a halogen atom or a methyl group. The parameters m and n are defined as positive integers, with n/m ranging from 0 to 2, preferably from 0 to 1. The patents also disclose methods for forming a resist pattern using these halogen-containing polyacrylate derivatives as a resist material.
Career Highlights
Hideo Shuyama is currently employed at Toyo Soda Manufacturing Co., Ltd. His work at this company has allowed him to focus on innovative research and development in the field of chemical materials. His contributions have been instrumental in advancing the technology related to halogen-containing compounds.
Collaborations
Shuyama has collaborated with notable coworkers such as Toru Seita and Yoshitaka Tsutsumi. These collaborations have fostered a productive environment for innovation and have led to significant advancements in their respective fields.
Conclusion
Hideo Shuyama's work in the development of halogen-containing polyacrylate derivatives showcases his innovative spirit and dedication to advancing materials science. His patents and collaborations reflect a commitment to excellence in research and development.