The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 18, 1989

Filed:

Nov. 23, 1987
Applicant:
Inventors:

Yoshitaka Tsutsumi, Sagamihara, JP;

Toru Seita, Atsugi, JP;

Hideo Shuyama, Hofu, JP;

Kousaburou Matsumura, Yokohama, JP;

Kyoko Nakazawa, Machida, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430325 ; 430270 ; 430322 ; 430323 ; 430326 ; 522152 ; 522153 ; 5262921 ; 526245 ; 526246 ; 560145 ; 560210 ; 524545 ; 524566 ;
Abstract

Halogen-containing polyacrylate derivatives having the formula: ##STR1## wherein A is a structural unit derived from a copolymeriazable monomer having a double bond; R is ##STR2## wherein each of R.sub.1 and R.sub.2 is a hydrogen atom or a fluorinated methyl group, provided R.sub.1 and R.sub.2 are not hydrogen atoms at the same time, and R.sub.3 is a hydrogen atom or a lower alkyl group; X is a halogen atom or a methyl group; and m is a positive integer, n is 0 or a positive integer, and n/m from 0 to 2, preferably from 0 to 1 are disclosed. Also disclosed are methods for forming a resist pattern by using the halogen-containing polyacrylate derivatives as a resist material.


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