Kousaburou Matsumura

Title: Kousaburou Matsumura: Innovator in Resist Materials

Introduction

Kousaburou Matsumura is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of resist materials, particularly in the development of positive resist patterns. With a total of 3 patents to his name, Matsumura's work has had a considerable impact on the industry.

Latest Patents

Matsumura's latest patents include innovative methods for creating positive resist patterns using derivatives of polyacrylic acid esters containing halogen. One of his patents describes a resist material characterized by a specific general formula, where A represents a structural unit derived from monomers with a copolymerizable double bond, and X can be a halogen atom or a methyl group. Another patent focuses on halogen-containing polyacrylate derivatives, detailing methods for forming resist patterns using these materials.

Career Highlights

Throughout his career, Kousaburou Matsumura has worked with prominent companies such as Toyo Soda Manufacturing Co., Ltd. and Tosoh Corporation. His experience in these organizations has allowed him to refine his expertise in resist materials and contribute to various advancements in the field.

Collaborations

Matsumura has collaborated with notable colleagues, including Yoshitaka Tsutsumi and Toru Seita. These partnerships have facilitated the exchange of ideas and innovations, further enhancing the quality of his work.

Conclusion

Kousaburou Matsumura is a distinguished inventor whose contributions to resist materials have paved the way for advancements in the industry. His patents and collaborations reflect his commitment to innovation and excellence in his field.