Kyoto, Japan

Hideo Ichihashi

This inventor holds 2 USPTO granted patents. Top assignee: Towa Corporation. Active years: 2022-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideo Ichihashi. Retrieved from https://idiyas.com/inventor/hideo-ichihashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.9

ph-index = 1


Company Filing History:


Years Active: 2022-2026

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2 patents (USPTO):Explore Patents

Title: Hideo Ichihashi: Innovator in Laser Processing Technology

Introduction

Hideo Ichihashi is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of laser processing technology. With a total of 2 patents to his name, Ichihashi continues to push the boundaries of innovation in his industry.

Latest Patents

Ichihashi's latest patents include a laser processing device and a processed article manufacturing method. The laser processing device is designed to stabilize and process films effectively. It features a conveyance mechanism that transports the film, a holding mechanism with a pair of holding parts that can sandwich and hold the lateral portions of the processing range, and a laser mechanism for processing the film held by the holding mechanism.

Career Highlights

Ichihashi is currently employed at Towa Corporation, where he applies his expertise in laser technology. His work has been instrumental in developing advanced manufacturing processes that enhance the quality and efficiency of film processing.

Collaborations

Ichihashi collaborates with talented coworkers, including Shin Yamane and Keita Mizuma. Their combined efforts contribute to the innovative projects at Towa Corporation.

Conclusion

Hideo Ichihashi is a prominent figure in the field of laser processing technology, with a focus on developing solutions that improve manufacturing processes. His contributions continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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