Hidemitsu Ogura

Title: Hidemitsu Ogura: Innovator in Semiconductor Technology

Introduction

Hidemitsu Ogura is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on enhancing the reliability and efficiency of non-volatile memory devices.

Latest Patents

One of his latest patents is for a non-volatile semiconductor memory device with contamination protection. This innovative device features a memory cell that includes a P-type silicon substrate and N-type diffusion regions that serve as word lines, sources, and drains. A floating gate extends over the diffusion regions, and a bit line connects to them. The design incorporates a passivation film and a contaminant shut-off layer, ensuring that contaminants are blocked during manufacturing, which significantly enhances product reliability.

Another notable patent involves a method of manufacturing a semiconductor non-volatile memory device. This invention includes a semiconductor substrate with insulating films that have at least two types of gate insulating films of different thicknesses. The structure allows for improved electrical performance and isolation between different diffusion layers, contributing to the overall efficiency of the memory device.

Career Highlights

Hidemitsu Ogura is associated with Kabushiki Kaisha Toshiba, a leading company in the technology sector. His work has been instrumental in advancing semiconductor technology, particularly in the realm of non-volatile memory devices.

Collaborations

He has collaborated with notable coworkers such as Masataka Takebuchi and Daisuke Tohyama, contributing to various innovative projects within the company.

Conclusion

Hidemitsu Ogura's contributions to semiconductor technology have made a significant impact on the industry. His innovative patents and dedication to enhancing memory device reliability continue to influence the field.