Hannou, Japan

Hideki Tomioka

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideki Tomioka. Retrieved from https://idiyas.com/inventor/hideki-tomioka-ee3cq6vo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Innovations of Hideki Tomioka in Semiconductor Manufacturing

Introduction

Hideki Tomioka is a notable inventor based in Hannou, Japan. He has made significant contributions to the field of semiconductor manufacturing. His innovative methods and apparatus have advanced the efficiency and effectiveness of semiconductor production.

Latest Patents

Tomioka holds a patent for a "Method of and apparatus for manufacturing semiconductors." This invention allows for the uniform supply of a liquid raw material onto a wafer, as well as the uniform supply of gas required for film formation. The process involves spraying a liquid raw material from a vaporizing nozzle into a vacuum chamber, where it is vaporized by heat generated from the wafer. This method enhances the quality and consistency of semiconductor manufacturing.

Career Highlights

Hideki Tomioka has been associated with Hitachi, Ltd., a leading company in technology and manufacturing. His work has been instrumental in developing advanced semiconductor technologies that are crucial for modern electronics.

Collaborations

Tomioka has collaborated with notable colleagues such as Toshio Ando and Akira Ohkawa. Their combined expertise has contributed to the success of various projects in semiconductor technology.

Conclusion

Hideki Tomioka's innovations in semiconductor manufacturing demonstrate his commitment to advancing technology in this critical field. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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