Company Filing History:
Years Active: 1998-2000
Title: The Innovations of Hideki Otake
Introduction
Hideki Otake is a prominent inventor based in Aichi, Japan. He has made significant contributions to the field of polishing compositions, holding a total of 3 patents. His work is particularly relevant in industries that require precision polishing techniques.
Latest Patents
Otake's latest patents include a polishing composition that comprises silicon nitride fine powder, water, and an acid. Another notable patent is a polishing composition specifically designed for polishing memory hard disks. This composition includes water and at least one abrasive selected from a group that consists of silicon dioxide, aluminum oxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride, and manganese dioxide. Additionally, it contains an iron compound dissolved in the mixture, which can be selected from iron(III) nitrate, iron(III) sulfate, ammonium iron(III) sulfate, iron(III) perchlorate, and an ion salt of an organic acid.
Career Highlights
Hideki Otake is currently employed at Fujimi Incorporated, a company known for its advanced polishing materials. His work at Fujimi has allowed him to develop innovative solutions that enhance the efficiency and effectiveness of polishing processes.
Collaborations
Otake has collaborated with notable coworkers such as Hitoshi Kodama and Satoshi Suzumura. Their combined expertise has contributed to the development of cutting-edge polishing technologies.
Conclusion
Hideki Otake's contributions to the field of polishing compositions demonstrate his innovative spirit and dedication to advancing technology. His patents reflect a commitment to improving industrial processes, making him a noteworthy figure in the realm of invention.