Fujimi Incorporated

Hideki Otake

Hitoshi Kodama

Atsunori Kawamura

Noritaka Yokomichi

Satoshi Suzumura

Shirou Miura

Masatoki Ito

Keigo Ohashi

A polishing composition comprising silicon nitride fine powder, water and an acid.

Polishing composition

A polishing composition for polishing a memory hard disk comprising water and at least one abrasive selected from the group consisting of silicon dioxide, aluminum oxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide, which further contains an iron compound dissolved in the composition, said iron compound being selected from the group consisting of iron(III) nitrate, iron(III) sulfate, ammonium iron(III) sulfate, iron(III) perchlorate and an ion salt of an organic acid.

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Aichi, Japan

Hideki Otake