Tokyo, Japan

Hideki Nakayama

USPTO Granted Patents = 2 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2025

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2 patents (USPTO):Explore Patents

Title: Innovations by Hideki Nakayama

Introduction

Hideki Nakayama is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of observation devices and processing methods. With a total of 2 patents, Nakayama's work focuses on enhancing the efficiency and accuracy of sample observation technologies.

Latest Patents

One of Nakayama's latest patents is a "Sample observation device and method." This invention involves a process where the device acquires low-picture quality learning images under specific imaging conditions. It determines the imaging count for high-picture quality learning images associated with defect positions and adjusts parameters related to defect detection. Another notable patent is the "Computer system of observation device and processing method." This technology aims to reduce the work effort involved in generating recipes that include alignment information for observation or inspection of samples.

Career Highlights

Nakayama is currently employed at Hitachi High-Tech Corporation, where he continues to innovate in the field of observation devices. His work has been instrumental in advancing technologies that improve the accuracy and efficiency of sample inspections.

Collaborations

He collaborates with notable coworkers such as Kosuke Matsumoto and Satoshi Takada, contributing to a dynamic team focused on technological advancements.

Conclusion

Hideki Nakayama's contributions to the field of observation devices and processing methods highlight his innovative spirit and dedication to improving technology. His patents reflect a commitment to enhancing the efficiency of sample observation processes.

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