Hitachi High-Tech Corporation

Hideki Nakayama

Yuji Takagi

Minoru Harada

Kosuke Matsumoto

Satoshi Takada

Yohei Minekawa

Naoaki Kondo

Miyuki Fukuda

Kozo Miyake

Yuki Doi

Yuya Isomae

In learning processing performed before sample observation processing (steps Sto S), the sample observation device acquires a low-picture quality learning image under a first imaging condition for each defect position indicated by defect position information, determines an imaging count of a plurality of high-picture quality learning images associated with the low-picture quality learning image for each defect position and a plurality of imaging points based on a set value of the imaging count, acquires the plurality of high-picture quality learning images under a second imaging condition (step S), learns a high-picture quality image estimation model using the low-picture quality learning image and the plurality of high-picture quality learning images (step S), and adjusts a parameter related to the defect detection in the sample observation processing using the high-picture quality image estimation model (step S).

Sample observation device and method

As a technology for an observation device and an inspection device, a technology capable of reducing a work effort related to generation of a recipe including alignment information is provided. An observation deviceincludes an observation unitthat obtains an image for observing a sampleon a stage. A computer systemof the observation deviceacquires the image from the observation unit, specifies a period of a pattern-formed unit region repeatedly formed on a surface of the samplefrom the image, and generates a recipe including observation or inspection alignment positions of the sampleusing the specified period.

Computer system of observation device and processing method

Growing community of inventors

Tokyo, Japan

Hideki Nakayama