Location History:
- Yamanashi, JP (2002)
- Nirasaki, JP (2003)
- Sagamihara, JP (2005)
Company Filing History:
Years Active: 2002-2005
Title: Innovations of Inventor Hideki Kiryu
Introduction
Hideki Kiryu is a notable inventor based in Sagamihara, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of dielectric films and gate insulating films. With a total of 3 patents to his name, Kiryu's work has had a substantial impact on the industry.
Latest Patents
Kiryu's latest patents include a method of forming a dielectric film and a method and system for forming a stacked gate insulating film. The first patent describes a process that involves adsorbing a gaseous molecular compound of a metal element on a silicon substrate and subsequently decomposing it through hydrolysis, pyrolytic decomposition, or oxidation. The second patent outlines the formation of a stacked gate insulating film, which consists of a silicon oxide film and a tantalum oxide film. This innovative film is created through a series of steps, including heat oxidation, etching, and dielectric film formation.
Career Highlights
Kiryu is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has allowed him to further develop his expertise and contribute to cutting-edge technologies in semiconductor fabrication.
Collaborations
Throughout his career, Kiryu has collaborated with esteemed colleagues such as Shintaro Aoyama and Hiroshi Shinriki. These collaborations have fostered an environment of innovation and have led to advancements in their respective fields.
Conclusion
Hideki Kiryu's contributions to semiconductor technology through his patents and work at Tokyo Electron Limited highlight his role as a significant inventor in the industry. His innovative methods for forming dielectric films and gate insulating films continue to influence the field.