Location History:
- Yokohama, JP (2005 - 2006)
- Kanagawa, JP (2015)
Company Filing History:
Years Active: 2005-2015
Title: Innovations of Hideki Kimijima
Introduction
Hideki Kimijima is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of integrated circuit devices and capacitors. With a total of 3 patents to his name, Kimijima's work reflects his expertise and innovative spirit.
Latest Patents
One of Kimijima's latest patents is an integrated circuit device that features a fuse with terminal portions connected to different conductive components. This design includes a cuttable portion that can be cut as needed by being irradiated with laser light. The cuttable portion is integrally formed with the terminal portions, which may be thicker than the cuttable section.
Another significant patent is for a MIM capacitor that incorporates flat diffusion prevention films. In this design, copper is used as a wiring material in RF-CMOS devices. To prevent copper from diffusing into the capacitor insulating film, diffusion prevention films are interposed between the insulating film and the electrodes. This innovation ensures that the copper forming the electrodes does not compromise the integrity of the capacitor insulating film.
Career Highlights
Hideki Kimijima is currently employed at Kabushiki Kaisha Toshiba, where he continues to develop cutting-edge technologies. His work has been instrumental in advancing the capabilities of integrated circuits and capacitors.
Collaborations
Kimijima has collaborated with notable colleagues, including Takashi Yoshitomi and Tatsuya Ohguro. Their combined expertise has contributed to the successful development of innovative technologies in their field.
Conclusion
Hideki Kimijima's contributions to the field of integrated circuits and capacitors highlight his innovative approach and dedication to technology. His patents reflect a commitment to advancing electronic components, making a significant impact in the industry.