Suwa, Japan

Hideki Horiuochi

This inventor holds 1 USPTO granted patent. Top assignee: Seiko Epson Corporation. Active years: 1997.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideki Horiuochi. Retrieved from https://idiyas.com/inventor/hideki-horiuochi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1997

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1 patent (USPTO):Explore Patents

Title: Innovations by Hideki Horiuochi

Introduction

Hideki Horiuochi is a notable inventor based in Suwa, Japan. He is recognized for his contributions to the field of stamp technology, particularly through his innovative patent that enhances the efficiency of stamp formation.

Latest Patents

Horiuochi holds a patent for a "Stamp unit and method of preparing stamp unit." This invention utilizes a liquid photosensitive resin as the base material for stamp formation. The design facilitates easier handling during transportation, storage, and the actual stamp formation process. The stamp unit employs a liquid photosensitive resin that transitions from liquid to solid upon exposure to light, ensuring a reliable and efficient stamping process.

Career Highlights

Horiuochi is associated with Seiko Epson Corporation, a leading company in imaging and printing technology. His work has significantly contributed to advancements in stamp technology, showcasing his expertise and innovative spirit.

Collaborations

Horiuochi has collaborated with notable colleagues such as Hiroshi Kuriyama and Haruyuki Miyasaka. Their combined efforts have furthered the development of innovative solutions in their respective fields.

Conclusion

Hideki Horiuochi's contributions to stamp technology through his innovative patent reflect his dedication to enhancing efficiency in the industry. His work continues to influence the field, showcasing the importance of innovation in everyday applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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