Ushiku, Japan

Hideki Gotoh


Average Co-Inventor Count = 3.1

ph-index = 6

Forward Citations = 157(Granted Patents)


Location History:

  • Tsuchiura, JP (1997)
  • Ushiku, JP (1990 - 2004)

Company Filing History:


Years Active: 1990-2004

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14 patents (USPTO):Explore Patents

Title: The Innovations of Hideki Gotoh

Introduction

Hideki Gotoh is a prominent inventor based in Ushiku, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 14 patents. His work has advanced the manufacturing processes and design of semiconductor devices, showcasing his expertise and innovative spirit.

Latest Patents

One of Hideki Gotoh's latest patents is focused on a semiconductor device and the method for manufacturing the same. This invention features a V-groove with a V-shaped cross-section formed on a semiconductor substrate or an epitaxial growth layer. An active layer is strategically provided only at the bottom of the V-groove. The manufacturing method involves creating a stripe-like etching protective film in the <011> direction of the semiconductor substrate, followed by gas etching using hydrogen chloride to form the V-groove. This innovative approach enhances the efficiency and performance of semiconductor devices.

Career Highlights

Throughout his career, Hideki Gotoh has worked with notable companies such as Mitsubishi Chemical Corporation and Mitsubishi Kasei Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Hideki Gotoh has collaborated with esteemed colleagues, including Kenji Shimoyama and Satoru Nagao. These partnerships have fostered a creative environment that has led to the development of innovative solutions in the semiconductor industry.

Conclusion

Hideki Gotoh's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the industry and pave the way for future advancements.

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