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For the Inventor, By the Inventor

Fujisawa, Japan

Hidekazu Takekoshi

This inventor holds 7 USPTO granted patents. Top assignee: Nuflare Technology, Inc.. Active years: 2011-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hidekazu Takekoshi. Retrieved from https://idiyas.com/inventor/hidekazu-takekoshi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 7

% Patents Active = 85.7

Average Co-Inventor Count = 1.2

ph-index = 2

Forward Citations = 5(Granted Patents)


Location History:

  • Kanagawa, JP (2011 - 2020)
  • Fujisawa, JP (2019 - 2022)

Company Filing History:

goldMedal7 out of 746 
 
Nuflare Technology, Inc.
 patents

Years Active: 2011-2022

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7 patents (USPTO):Explore Patents
1. 11342157 - Charged particle beam inspection apparatus and charged particle beam inspection method (2022-05-24),
2. 10896801 - Multiple electron beam image acquisition apparatus, and alignment method of multiple electron beam optical system (2021-01-19),
3. 10665422 - Electron beam image acquisition apparatus, and electron beam image acquisition method (2020-05-26),
4. 10373798 - Multi charged particle beam inspection apparatus, and multi charged particle beam inspection method (2019-08-06),
5. 10345724 - Position correction method of stage mechanism and charged particle beam lithography apparatus (2019-07-09),
6. 8421040 - Writing apparatus and writing method (2013-04-16),
7. 8030626 - Apparatus and method for charged-particle beam writing (2011-10-04),

Title: Innovations of Hidekazu Takekoshi

Introduction

Hidekazu Takekoshi is a prominent inventor based in Fujisawa, Japan. He has made significant contributions to the field of charged particle beam technology, holding a total of seven patents. His work focuses on advanced inspection apparatuses and methods that enhance the precision and efficiency of electron beam applications.

Latest Patents

Among his latest patents is the "Charged Particle Beam Inspection Apparatus and Charged Particle Beam Inspection Method." This invention features a movable stage designed to hold a substrate, along with a stage control circuit that continuously moves the stage in a specific direction. It also includes a deflection control circuit that collectively deflects multiple beams to a designated small region group. Another notable patent is the "Multiple Electron Beam Image Acquisition Apparatus and Alignment Method of Multiple Electron Beam Optical System." This apparatus incorporates an electromagnetic lens, an aberration corrector, and a movable stage to align the position of the aberration corrector with the multiple electron beams.

Career Highlights

Hidekazu Takekoshi is currently employed at Nuflare Technology, Inc., where he continues to innovate in the field of electron beam technology. His work has been instrumental in advancing the capabilities of charged particle beam inspection systems, contributing to various applications in the semiconductor industry.

Collaborations

He has collaborated with notable coworkers, including Kazuhiko Inoue and Yoshihiro Izumi, who share his passion for innovation in technology.

Conclusion

Hidekazu Takekoshi's contributions to charged particle beam technology exemplify the spirit of innovation. His patents reflect a commitment to enhancing inspection methods and apparatuses, making a significant impact in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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