The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 19, 2021

Filed:

May. 22, 2019
Applicant:

Nuflare Technology, Inc., Yokohama, JP;

Inventors:

Kazuhiko Inoue, Yokohama, JP;

Yoshihiro Izumi, Yokohama, JP;

Hidekazu Takekoshi, Fujisawa, JP;

Assignee:

NuFlare Technology, Inc., Yokohama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/153 (2006.01); G01N 21/956 (2006.01); G01N 21/95 (2006.01); H01L 21/67 (2006.01); G06T 7/00 (2017.01); G06T 7/11 (2017.01); H01J 37/147 (2006.01); H01J 37/20 (2006.01); H01J 37/244 (2006.01); H01J 37/141 (2006.01);
U.S. Cl.
CPC ...
H01J 37/153 (2013.01); G01N 21/9501 (2013.01); G01N 21/95607 (2013.01); G06T 7/001 (2013.01); G06T 7/11 (2017.01); H01J 37/141 (2013.01); H01J 37/1471 (2013.01); H01J 37/1475 (2013.01); H01J 37/20 (2013.01); H01J 37/244 (2013.01); H01L 21/67288 (2013.01); G06T 2207/30148 (2013.01); H01J 2237/1534 (2013.01); H01J 2237/2448 (2013.01);
Abstract

A multiple-electron-beam-image acquisition apparatus includes an electromagnetic lens to receive and refract multiple electron beams, an aberration corrector, disposed in a magnetic field of the electromagnetic lens, to correct aberration of the multiple electron beams, an aperture-substrate, disposed movably at the upstream of the aberration corrector with respect to an advancing direction of the multiple electron beams, to selectively make an individual beam of the multiple electron beams pass therethrough independently, a movable stage to dispose thereon the aberration corrector, a stage control circuit, using an image caused by the individual beam selectively made to pass, to move the stage to align the position of the aberration corrector to the multiple electron beams having been relatively aligned with the electromagnetic lens, and a detector to detect multiple secondary electron beams emitted because the target object surface is irradiated with multiple electron beams having passed through the aberration corrector.


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