Hidekazu Okuhira

Title: Innovations of Hidekazu Okuhira

Introduction

Hidekazu Okuhira is a prominent inventor based in Hachioji, Japan. He has made significant contributions to the field of electron microscopy and etching methods, holding a total of seven patents. His work has advanced the capabilities of observing defects in materials and improving etching techniques.

Latest Patents

One of Okuhira's latest patents is a defect observing electron microscope. This innovative transmission electron microscope allows for the detection of defects without applying undesirable treatments to the specimen. It utilizes a reference specimen prepared separately from the specimen being observed. The design features a pair of specimen holders that are detachable from the electron microscope's column, arranged adjacently at upper and lower stages along the electron beam axis. This configuration positions the specimens closely to each other in the electron beam illuminating position. The holders can be independently set or removed from this position, and they include devices for finely adjusting the spacing between the specimens and their angles relative to the electron beam axis.

Another notable patent is a dry etching method. This method is designed to dry etch a sample that includes multiple regions with different photo-absorption characteristics when exposed to light of a specified wavelength. By using etching gas plasma, the method selectively etches desired materials from a variety of materials with differing band gap energies. It involves irradiating light on the sample to reduce the etching rate in regions with a high photo-absorption coefficient, thereby allowing for selective etching of regions with a lower photo-absorption coefficient.

Career Highlights

Hidekazu Okuhira is associated with Hitachi, Ltd., where he has contributed to various innovative projects. His expertise in electron microscopy and etching methods has positioned him as a key figure in advancing technology in these areas.

Collaborations

Okuhira has worked alongside notable colleagues such as Yasuo Wada and Akira Shintani. Their collaborative efforts have further enhanced the research and development of advanced technologies in their field.

Conclusion

Hidekazu Okuhira's contributions to the fields of electron microscopy and etching methods have significantly impacted technological advancements. His innovative patents reflect his dedication to improving material observation and processing techniques.