Kagoshima, Japan

Hidekazu Matsushita

This inventor holds 1 USPTO granted patent. Top assignee: Nec Lcd Technologies, Ltd.. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hidekazu Matsushita. Retrieved from https://idiyas.com/inventor/hidekazu-matsushita

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: The Innovations of Hidekazu Matsushita

Introduction

Hidekazu Matsushita is a notable inventor based in Kagoshima, Japan. He has made significant contributions to the field of liquid crystal display (LCD) technology. His innovative methods have paved the way for advancements in the manufacturing of TFT panels.

Latest Patents

Matsushita holds a patent for a method for manufacturing an LCD device. This patent outlines a process that includes wet etching a multilayer metallic structure, which consists of high-melting-point metal films and aluminum films. The method employs a side etching technique using a photoresist mask, followed by hot-water washing of the side walls of the aluminum film. Additionally, it involves dry etching to configure the channel region of a TFT in each pixel, while ensuring the protection of the aluminum from corrosion during the etching process.

Career Highlights

Matsushita is associated with NEC LCD Technologies, Ltd., where he has contributed to the development of cutting-edge LCD technologies. His work has been instrumental in enhancing the efficiency and quality of LCD manufacturing processes.

Collaborations

Matsushita has collaborated with notable colleagues such as Tsuyoshi Katoh and Satoshi Doi. Their combined expertise has further advanced the innovations in LCD technology.

Conclusion

Hidekazu Matsushita's contributions to LCD technology through his innovative patent demonstrate his significant role in the field. His work continues to influence the development of advanced display technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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