Shimonoseki, Japan

Hidekazu Harada

This inventor holds 3 USPTO granted patents. Top assignee: Kabushiki Kaisha Kobe Seiko Sho. Active years: 1984-1987.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hidekazu Harada. Retrieved from https://idiyas.com/inventor/hidekazu-harada-1g9leuas

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 14(Granted Patents)


Location History:

  • Shimonoseki, JP (1984 - 1986)
  • Funabashi, JP (1987)

Company Filing History:


Years Active: 1984-1987

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3 patents (USPTO):Explore Patents

Title: The Innovations of Hidekazu Harada

Introduction

Hidekazu Harada is a notable inventor based in Shimonoseki, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced copper alloys. With a total of 3 patents to his name, Harada's work is recognized for its practical applications in semiconductor technology.

Latest Patents

One of Harada's latest patents is focused on a copper alloy that comprises 1.0 to 3.5 wt. % of Ni, 0.2 to 0.9 wt. % of Si, 0.02 to 1.0 wt. % of Mn, 0.1 to 5.0 wt. % of Zn, 0.1 to 2.0 wt. % of Sn, and 0.001 to 0.01 wt. % of Mg, along with 0.001 to 0.01 wt. % of one or more members selected from Cr, Ti, and Zr, with the remainder being substantially Cu. This copper alloy is particularly suitable for lead frames for semiconductors, as well as terminals and connectors. The production process involves cooling from a temperature above 600°C at a rate of 5°C per second or higher after hot rolling, followed by annealing and refining finish rolling.

Another significant patent by Harada is for lead materials used in semiconductor devices. This material comprises from 0.4 to 4.0 wt. % of Ni, from 0.1 to 1.0 wt. % of Si, from 0.05 to 1.0 wt. % of Zn, from 0.01 to 1.0 wt. % of Mn, and other components, with the balance being Cu and inevitable impurities. The material may also include trace amounts of hydrogen and oxygen, enhancing its suitability for semiconductor applications.

Career Highlights

Harada is currently associated with Kabushiki Kaisha Kobe Seiko Sho, where he continues to innovate in the field of materials for electronic components. His work has been instrumental in advancing the performance and reliability of semiconductor devices.

Collaborations

Throughout his career, Harada has collaborated with notable colleagues such as Motohisa Miyafuji and Takashi Matsui. These collaborations have contributed to

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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