Tsukuba, Japan

Hidehiko Tanaka

This inventor holds 2 USPTO granted patents and 2 EPO patents. Top assignees: National Institute for Materials Science, Shin-Etsu Chemical Co., Ltd.. Active years: 2013-2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hidehiko Tanaka. Retrieved from https://idiyas.com/inventor/hidehiko-tanaka-bmxri9qq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2013-2015

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2 patents (USPTO):Explore Patents

Title: The Innovations of Hidehiko Tanaka

Introduction

Hidehiko Tanaka is a notable inventor based in Tsukuba, Japan. He has made significant contributions to the field of materials science, particularly in the production of silicon carbide. With a total of 2 patents, Tanaka's work has garnered attention for its innovative approaches and practical applications.

Latest Patents

Tanaka's latest patents focus on a method of producing silicon carbide. This method involves heating a cured product of a curable silicone composition in a non-oxidizing atmosphere at temperatures exceeding 1,500°C but not more than 2,600°C. The process is designed to produce high-purity silicon carbide efficiently and with a high degree of productivity. Additionally, it allows for the simple production of silicon carbide molded items with desired shapes and dimensions.

Career Highlights

Throughout his career, Tanaka has worked with esteemed organizations such as the National Institute for Materials Science and Shin-Etsu Chemical Co., Ltd. His experience in these institutions has contributed to his expertise in materials science and innovation.

Collaborations

Tanaka has collaborated with various professionals in his field, including his coworker Yoshitaka Aoki. These collaborations have likely enhanced his research and development efforts.

Conclusion

Hidehiko Tanaka's contributions to the production of silicon carbide highlight his innovative spirit and dedication to advancing materials science. His patents reflect a commitment to efficiency and quality in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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