This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignees: Dainippon Screen Mfg. Co., Ltd., Screen Holdings Co., Ltd.. Active years: 2010-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 1,306 
1 out of 157 Years Active: 2010-2026
Title: Innovations by Hidehiko Ozaki
Introduction
Hidehiko Ozaki is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate processing technology. His innovative approach has led to the development of a unique apparatus that enhances the accuracy of gas concentration measurements.
Latest Patents
One of Hidehiko Ozaki's key patents is a substrate processing apparatus. This invention dilutes a sample gas by mixing it with nitrogen gas and measures the concentration of isopropyl alcohol (IPA) gas contained in the diluted sample. The apparatus calculates the concentration of IPA gas in the original sample by multiplying the measured concentration by the reciprocal of the dilution rate. This method allows for accurate measurement even when high concentrations of IPA gas are used.
Career Highlights
Hidehiko Ozaki is associated with Dainippon Screen Mfg. Co., Ltd., a company known for its advancements in semiconductor manufacturing equipment. His work at this company has been instrumental in developing technologies that improve processing efficiency and accuracy.
Conclusion
Hidehiko Ozaki's contributions to substrate processing technology exemplify the impact of innovative thinking in the field. His patent demonstrates a significant advancement in gas concentration measurement, showcasing his expertise and commitment to enhancing industrial processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile