This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Jsr Corporation. Active years: 2016.
Company Filing History:
Years Active: 2016
Title: Innovations of Hidefumi Ishikawa
Introduction
Hidefumi Ishikawa is a notable inventor based in Minato-ku, Japan. He has made significant contributions to the field of photosensitive resin compositions, which are essential in the production of resist patterns. His work has implications for various applications in the semiconductor industry.
Latest Patents
Ishikawa holds a patent for a photosensitive resin composition and method for producing a resist pattern. This invention provides a composition that includes an alkali-soluble resin, a compound with ethylenically unsaturated double bonds, a photo radical polymerization initiator with a keto oxime ester structure, and a specific compound represented by designated formulas. The innovative aspect of this composition is its ability to form resist patterns with excellent resolution without the need for an oxygen inhibition layer.
Career Highlights
Ishikawa is associated with JSR Corporation, where he has been instrumental in advancing technologies related to photosensitive materials. His expertise in this area has led to the development of solutions that enhance the efficiency and effectiveness of resist pattern formation.
Collaborations
Ishikawa has collaborated with notable colleagues, including Hisanori Akimaru and Hirokazu Sakakibara. These collaborations have contributed to the advancement of research and development in their field.
Conclusion
Hidefumi Ishikawa's contributions to the field of photosensitive resin compositions highlight his innovative spirit and dedication to advancing technology. His work continues to influence the semiconductor industry and improve manufacturing processes.