This inventor holds 1 USPTO granted patent. Top assignee: Matsushita Electric Industrial Co., Ltd.. Active years: 2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2008
Title: Innovations by Hideaki Kunitake
Introduction
Hideaki Kunitake is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor manufacturing. His innovative approaches have led to advancements in substrate polishing methods, which are crucial for the production of high-quality semiconductor devices.
Latest Patents
Kunitake holds a patent for a substrate polishing method and a method of manufacturing semiconductor devices. This patent outlines a technique that can be utilized in a substrate polishing apparatus featuring multiple carriers for a single polishing pad. The method allows for the determination of the necessary polishing time to achieve a specific amount of polishing while using only a subset of the available carriers. By obtaining a correction coefficient that correlates the polishing times of all carriers with those of a partial set, Kunitake's method simplifies the polishing process for various substrates.
Career Highlights
Kunitake is associated with Matsushita Electric Industrial Co., Ltd., a company renowned for its innovations in electronics and technology. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes. With a focus on precision and quality, Kunitake continues to contribute to advancements in the industry.
Collaborations
Kunitake has collaborated with notable colleagues, including Katsuyuki Ikenouchi and Yasunori Fukui. Their combined expertise has fostered a collaborative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Hideaki Kunitake's contributions to the field of semiconductor manufacturing through his innovative substrate polishing method exemplify the importance of research and development in technology. His work not only enhances manufacturing processes but also sets a foundation for future advancements in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
