Koshi, Japan

Hideaki Kumashiro

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Tokyo Electron Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideaki Kumashiro. Retrieved from https://idiyas.com/inventor/hideaki-kumashiro

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations by Hideaki Kumashiro

Introduction

Hideaki Kumashiro is a notable inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing technology. His innovative approach has led to the development of a unique substrate processing apparatus.

Latest Patents

Kumashiro holds a patent for a substrate processing apparatus and substrate processing method. This apparatus is designed to dry a substrate using a processing fluid in a supercritical state. The system includes a processing vessel, a substrate holder, a first supply line for the processing fluid, a drain line for fluid removal, and a bypass line that allows part of the processing fluid to be drained without passing through the processing vessel. Additionally, it features a bypass opening/closing valve to control the flow.

Career Highlights

Kumashiro is associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work has been instrumental in advancing substrate processing techniques, which are crucial for various applications in electronics.

Collaborations

He has collaborated with notable colleagues such as Masami Yamashita and Satoru Tanaka, contributing to the innovative environment at Tokyo Electron Limited.

Conclusion

Hideaki Kumashiro's contributions to substrate processing technology exemplify the spirit of innovation. His patent reflects a significant advancement in the field, showcasing his expertise and dedication to improving manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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