This inventor holds 1 USPTO granted patent. Top assignee: Benkan Corporation. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: Innovations of Hideaki Higuchi in Gas Control Technology.
Introduction
Hideaki Higuchi is a notable inventor based in Yabuzuka Honmachi, Japan. He has made significant contributions to the field of semiconductor manufacturing through his innovative designs and patents. His work focuses on improving the efficiency and functionality of gas control systems.
Latest Patents
Higuchi holds a patent for an integrated gas control device. This invention pertains to a high purity gas supply system for semiconductor manufacturing apparatuses. The device is designed to make the gas control line compact, allowing for easy mounting and removal of gas control units. It also enables flexible design of flow passages, reduces total lead time for manufacturing, and simplifies the replacement of parts using standardized components.
Career Highlights
Higuchi is associated with Benkan Corporation, where he applies his expertise in gas control technology. His innovative approach has led to advancements in the efficiency of semiconductor manufacturing processes. His patent reflects his commitment to enhancing the functionality of gas supply systems.
Collaborations
Higuchi has worked alongside notable colleagues such as Yoshitomo Fukushima and Kazuhisa Sato. Their collaborative efforts contribute to the ongoing development of innovative solutions in the field.
Conclusion
Hideaki Higuchi's contributions to gas control technology exemplify the importance of innovation in semiconductor manufacturing. His patent for an integrated gas control device showcases his ability to address industry challenges effectively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile