The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2000
Filed:
Jan. 30, 1998
Yoshitomo Fukushima, Yabuzuka Honmachi, JP;
Hideaki Higuchi, Yabuzuka Honmachi, JP;
Kazuhisa Sato, Yabuzuka Honmachi, JP;
Benkan Corporation, Tokyo, JP;
Abstract
The present invention relates to an integrated gas control device in a high purity gas supply system for a semiconductor manufacturing apparatus in which a gas control line is made compact and gas control units are easily mounted or removed and a flow passage can be flexibly designed and a total lead time for manufacturing can be made shorter and parts can be easily replaced for changing the flow passage by using the standardized constitution parts. In the integrated gas control unit, the adjacent passage blocks are connected to each other with a metal gasket inserted therebetween such that a gas flowing-out passage communicates with the gas flowing-in passage and are mounted on a base plate along many gas supply control lines arranged in parallel. The body of the desired gas control unit such as an automatic diaphragm valve or the like which is constituted longitudinally is inserted into the mounting hole of each passage block with a gasket inserted therebetween. The gas control unit is removably connected to the passage block by screwing a connecting cylinder fitted on the body on the passage block.