Herve C Kieffel

Title: The Innovative Contributions of Herve C Kieffel

Introduction

Herve C Kieffel is a notable inventor based in San Francisco, CA. He has made significant contributions to the field of semiconductor technology. His work focuses on improving the efficiency and accuracy of plasma etching processes.

Latest Patents

Herve C Kieffel holds a patent for an "End point detection method for plasma etching of semiconductor wafers with low exposed area." This innovative method involves controlling the plasma etching of semiconductor wafers by determining the impedance of a plasma chamber. The process utilizes values representing voltage, current, and the phase angle between them, as provided by a sensor. During a first time period, all or less than all of the data may be used to calculate a model. In a subsequent time period, real-time data is employed to calculate a version of the instant impedance of the chamber. This version is then compared to a time-projected version of the model. The method effectively determines when etching should be stopped based on deviations from the extrapolated model. In some embodiments, a rolling average is used during the second time period, which is compared to the model to ascertain the end point condition.

Career Highlights

Herve C Kieffel is currently associated with Pivotal Systems Corporation, where he continues to advance his research and development efforts. His expertise in semiconductor technology has positioned him as a valuable asset in his field.

Collaborations

Herve has collaborated with notable colleagues such as Sumer Johal and Barton Lane, contributing to various projects and innovations within the semiconductor industry.

Conclusion

Herve C Kieffel's innovative work in plasma etching technology exemplifies the impact of dedicated inventors in advancing semiconductor manufacturing processes. His contributions continue to shape the future of this critical industry.