Ridderkerk, Netherlands

Herre Tjerk Steenstra

This inventor holds 1 USPTO granted patent and 2 published patent applications and 1 EPO patent. Top assignee: Mapper Lithography IP B.v.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Herre Tjerk Steenstra. Retrieved from https://idiyas.com/inventor/herre-tjerk-steenstra

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2018

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Herre Tjerk Steenstra: Innovator in Lithography Technology

Introduction

Herre Tjerk Steenstra is a notable inventor based in Ridderkerk, Netherlands. He has made significant contributions to the field of lithography, particularly through his innovative patent that enhances the efficiency of lithography apparatus.

Latest Patents

Steenstra holds a patent for a "Control system and method for lithography apparatus." This invention outlines a method for initializing operations in a lithography module, which includes generating clock signals and determining synchronization values to optimize the performance of the apparatus. His patent is a testament to his expertise and commitment to advancing lithography technology. He has 1 patent to his name.

Career Highlights

Herre Tjerk Steenstra is associated with Mapper Lithography IP B.V., a company that specializes in developing advanced lithography systems. His work at Mapper Lithography has positioned him as a key player in the industry, contributing to the evolution of lithography techniques.

Collaborations

(Section skipped due to space constraints.)

Conclusion

Herre Tjerk Steenstra's contributions to lithography technology through his innovative patent demonstrate his expertise and dedication to the field. His work continues to influence advancements in lithography systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…