Veldhoven, Netherlands

Hermanus Kreuwel


 

Average Co-Inventor Count = 5.5

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Schijndel, NL (2017)
  • Veldhoven, NL (2018)

Company Filing History:


Years Active: 2017-2018

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2 patents (USPTO):Explore Patents

Title: Unveiling the Innovations of Inventor Hermanus Kreuwel

Introduction:

Meet Hermanus Kreuwel, a brilliant inventor based in Veldhoven, Netherlands, whose contribution to the field of EUV radiation sources has been truly groundbreaking. With a total of 2 patents under his belt, Hermanus Kreuwel has been instrumental in advancing technology in this critical area.

Latest Patents:

Hermanus Kreuwel's latest patents showcase his expertise in developing radiation sources for generating EUV radiation. One of his inventions involves a laser system that fires laser pulses at a target area containing fuel droplets, such as tin droplets, to emit EUV radiation. These droplets are pre-conditioned to optimize their response to the laser pulses, ensuring maximum efficiency in radiation generation. Another patent highlights his work on a radiation source with a fuel stream generator and laser radiation assemblies to create a radiation-generating plasma for collection.

Career Highlights:

Hermanus Kreuwel's career is deeply intertwined with technological giant ASML Netherlands B.V., where his innovative spirit has thrived. Within this renowned company, he has spearheaded projects pushing the boundaries of EUV radiation technology, setting new standards for performance and precision.

Collaborations:

In his quest for innovation, Hermanus Kreuwel has collaborated with esteemed colleagues such as Jan Bernard Plechelmus Van Schoot and Andrei Mikhailovich Yakunin. Together, they have combined their expertise to drive cutting-edge research and development in the field of radiation sources, cementing their status as pioneers in the industry.

Conclusion:

Inventor Hermanus Kreuwel's passion for revolutionizing EUV radiation technology has led to significant advancements in the field. His patents and collaborations reflect a relentless pursuit of excellence and a commitment to pushing the boundaries of what is possible. As he continues to innovate and inspire, the world eagerly anticipates the next chapter in his journey of technological advancement.

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