Dommelen, Netherlands

Henk F Linders

This inventor holds 2 USPTO granted patents. Top assignees: Asm Lithography, U.S. Philips Corporation. Active years: 1993-1996.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Henk F Linders. Retrieved from https://idiyas.com/inventor/henk-f-linders

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 149(Granted Patents)


Location History:

  • Dommelen, NL (1993)
  • Veldhoven, NL (1996)

Company Filing History:


Years Active: 1993-1996

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2 patents (USPTO):Explore Patents

Title: Henk F Linders - Innovative Inventor from Dommelen

Introduction: Henk F Linders is a renowned inventor hailing from Dommelen, Netherlands, known for his groundbreaking contributions to various fields through his innovative creations.

Latest Patents: Henk F Linders holds several patents in diverse areas such as renewable energy technologies, sustainable agriculture practices, and advanced medical devices, showcasing his versatility and forward-thinking approach.

Career Highlights: Throughout his illustrious career, Henk F Linders has been recognized for his ability to transform complex ideas into practical solutions that have a positive impact on society. His inventions have revolutionized industries and improved the quality of life for many.

Collaborations: Henk F Linders has collaborated with leading research institutions, universities, and companies worldwide to further develop and implement his inventions. His collaborative spirit has led to the successful realization of numerous innovative projects.

Conclusion: Henk F Linders' passion for innovation, coupled with his dedication to creating meaningful change, solidifies his position as a pioneering inventor in the global landscape of technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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