The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 1996
Filed:
May. 06, 1993
Applicant:
Inventors:
Marinus A Van Den Brink, Veldhoven, NL;
Henk F Linders, Veldhoven, NL;
Stefan Wittekoek, Veldhoven, NL;
Assignee:
ASM Lithography, Veldhoven, NL;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356401 ;
Abstract
An apparatus for projecting a mask pattern (MA) on a substrate (W) by means of a projection lens system (PL) is described, which apparatus comprises a device for aligning a mask alignment mark (M.sub.1, M.sub.2) with respect to a substrate alignment mark (P.sub.1, P.sub.2). Means (WE.sub.1, WE.sub.2) preventing phase differences due to reflections at the mask plate (MA) from occurring within the alignment beam portions received by a detection system (13, 13') are arranged in the path of selected alignment beam portions (b.sub.1, b.sub.1 ').