Nijmegen, Netherlands

Hendrik Punter

This inventor holds 1 USPTO granted patent. Top assignee: U.S. Philips Corporation. Active years: 1983.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hendrik Punter. Retrieved from https://idiyas.com/inventor/hendrik-punter

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1983

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1 patent (USPTO):Explore Patents

Title: Hendrik Punter: Innovator in Semiconductor Manufacturing

Introduction

Hendrik Punter is a notable inventor based in Nijmegen, Netherlands. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative methods involving aluminum diffusion.

Latest Patents

Hendrik Punter holds a patent for a method of diffusing aluminum. This patent describes a process for manufacturing a semiconductor device where an aluminum-containing layer is applied to a silicon semiconductor body. The method involves a diffusion treatment that allows aluminum to be diffused into the silicon body, forming an aluminum-doped region. Notably, the aluminum source is divided into small parts, ensuring that their shape remains unchanged during the diffusion process.

Career Highlights

Hendrik Punter is associated with U.S. Philips Corporation, where he has contributed to advancements in semiconductor technology. His work has been instrumental in improving the efficiency and effectiveness of semiconductor devices.

Collaborations

Hendrik has collaborated with Kornelis J Wagenaar, working together to enhance the development of semiconductor manufacturing techniques.

Conclusion

Hendrik Punter's innovative approach to aluminum diffusion in semiconductor manufacturing showcases his expertise and commitment to advancing technology in this critical field. His contributions continue to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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