The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 1983
Filed:
Nov. 16, 1981
Hendrik Punter, Nijmegen, NL;
Kornelis J Wagenaar, Nijmegen, NL;
U.S. Philips Corporation, New York, NY (US);
Abstract
A method of manufacturing a semiconductor device in which an aluminum-containing layer, hereinafter referred to as the aluminum source, is locally provided on a semiconductor body 1,2 of silicon and, in a subsequent diffusion treatment, aluminum is diffused from the aluminium source 3 into the silicon body 1,2, and an aluminum-doped region 4 is formed in the silicon body 1,2, characterized in that, prior to the diffusion treatment, the aluminum source 3 is divided into parts 5 each having an area which is small as compared with the area of the region 4 to be formed, with a mutual distance which is smaller than double the distance over which the aluminum in the diffusion treatment is diffused laterally into the silicon body 1,2, and which parts 5 have an uninterrupted shape and are so small that during the diffusion treatment their uninterrupted shape remains unvaried.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile