Harbin, China

Henan Liu


Average Co-Inventor Count = 10.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Innovations by Henan Liu in Optical Crystal Repair Technology.

Introduction

Henan Liu is an accomplished inventor based in Harbin, China. He has made significant contributions to the field of optical materials and surface repair technology. His innovative approach has led to the development of a unique method for repairing damage points on optical crystals.

Latest Patents

Henan Liu holds a patent for a "Variable-step-distance micro-milling repair cutter path generating method for damage points on the surface of optical crystal." This method involves establishing a mathematical model of a repair profile and determining discrete contact points between a cutter and the repair profile. The process utilizes a GPR path generating method to control the movement trend of a pseudo-random path. By interpolating the cutter position control point set into a spatial curve using a NURBS modeling method, Liu creates a UG curve in UG software, which serves as the repair path for machining process simulation. This innovative method effectively eliminates cutter marks with a constant period and enhances the KDP crystal's resistance to strong laser damage. He has 1 patent to his name.

Career Highlights

Henan Liu is affiliated with the Harbin Institute of Technology, where he continues to advance research in optical materials. His work has garnered attention for its practical applications in improving the durability and performance of optical elements.

Collaborations

Henan Liu collaborates with notable colleagues, including Jian Cheng and Mingjun Chen, who contribute to his research endeavors. Their combined expertise fosters a productive environment for innovation in optical technology.

Conclusion

Henan Liu's contributions to the field of optical crystal repair technology exemplify the impact of innovative thinking in scientific research. His patented method not only addresses critical challenges in optical material repair but also enhances the performance of optical elements in various applications.

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