Kirchberg Am Walde, Austria

Helmut Riedl


 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Helmut Riedl: Innovations in Sputter Target Technology

Introduction: Helmut Riedl, an accomplished inventor based in Kirchberg Am Walde, Austria, has made significant contributions to the field of materials science. With one notable patent under his name, Riedl's work focuses on advancements in sputter target technology, which is essential for various physical vapor deposition processes.

Latest Patents: Riedl holds a patent titled "Sputter target and method for producing a sputter target." This invention involves a target for use in a physical vapor deposition process that features a matrix composed of composite materials, including aluminum-based, titanium-based, and chromium-based materials. The matrix is uniquely doped with doping elements, which are embedded as constituents of ceramic compounds or aluminum alloys. The doping elements selected from lanthanides such as La, Ce, Nb, Sm, and Eu enhance the performance of the sputter target, making it a valuable innovation in the field.

Career Highlights: Currently, Helmut Riedl works at Plansee Composite Materials GmbH, where he applies his expertise in developing advanced materials for various applications. His work is integral to the company's mission to innovate and produce high-quality products for the semiconductor and coatings industries.

Collaborations: Throughout his career, Riedl has collaborated with industry professionals, including colleagues like Peter Polcik and Szilard Kolozsvari. These collaborations help to foster innovation and facilitate the exchange of ideas, contributing to the development of cutting-edge materials and technologies.

Conclusion: Helmut Riedl's contributions to sputter target technology reflect his commitment to innovation and excellence in materials science. With his patent and ongoing work at Plansee Composite Materials GmbH, Riedl continues to advance the field and enhance the efficiency of physical vapor deposition processes. His collaborations with fellow experts further strengthen the impact of his contributions in the industry.

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