Helmut M Gartner

Title: Helmut M Gartner: Innovator in Semiconductor Technology

Introduction

Helmut M Gartner is a notable inventor based in Wappingers Falls, NY (US). He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches.

Latest Patents

One of his latest patents is titled "Ion milling of thin metal films." This patent describes a process where metals such as platinum and palladium are preferentially removed in the presence of their metal silicides by ion milling in a noble gas atmosphere, such as argon. This technique can be applied to semiconductor chips to eliminate excess platinum after platinum silicide has been formed in the contact holes. Another significant patent is the "Method of forming thin film interconnection systems." This method outlines a process for creating thin film interconnection patterns atop substrates, particularly semiconductor substrates. It utilizes the passivation layer, typically glass, as a stable masking material to etch conductive lines. Additionally, the metal conductor serves as a stable mask in etching the glass to form via holes, providing a practical resist system compatible with reactive ion etching or other dry etching processes.

Career Highlights

Helmut M Gartner is associated with the International Business Machines Corporation (IBM), where he has contributed to various projects and advancements in semiconductor technology. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Throughout his career, Helmut has collaborated with notable colleagues, including Kenneth Chang and David C Cosman. These collaborations have further enriched his contributions to the field.

Conclusion

Helmut M Gartner's innovative work in semiconductor technology, particularly through his patents, has made a lasting impact on the industry. His contributions continue to influence advancements in semiconductor manufacturing processes.